The most common way of measuring diffusion length is via SPV, a technique that uses the SPV response of multiple wavelengths to calculate diffusion length. This measurement technique works well in semiconductor grade silicon where the wafer thickness is greater than 3 times the diffusion length.
Technical Note #201 explains the theory of SPV measurement of diffusion length.
The WT-2000 offers maps of diffsion length measurements for semiconductor wafers, via a benchtop system. The WT-3000 offers similar capability via a dual FOUP system for 300mm wafers.