Emitter sheet resistance is a primary quality control parameter for silicon cells in PV applications. The CMS models, CMS-1 & -3, Emitter Sheet Resistance Testers allow measurement of wafers “on the fly”, i.e. conveyor belt does not stop during measurement. Therefore, they have the high throughput that meets the requirement of in-line quality control in fully automated cell production lines.
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SYSTEM SPECIFICATIONS:
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measurement technique:
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sample size:
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100 to 210mm
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sample structure:
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np or pn junctions
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measurement range
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10 Ω/sq. to 200 Ω/sq.
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accuracy:
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<6%
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repeatability:
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<3%
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probe distance:
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3mm probe height above transport belt
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measured spot diameter:
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8mm
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wafer vertical position tolerance:
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<200 µm peak to peak, including vibration
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measure spot diameter:
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8mm
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sample support:
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on belt
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system dimensions:
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135mm x 460mm x 403mm (WxHxD)
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Number of measurement points
(for 1 head):
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35 point line scan on a 156x156mm wafer in case of 250mm/s belt speed
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| Additional configurations available if needed |
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| IN-LINE APPLICATION: |
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Emitter diffusion monitoring
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| CONFIGURATION OF A SYSTEM: |
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CMS measurement module (incl. 1-5 sheet resistance measurement heads) |
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Industrial PC (Windows® operating system) and peripherals
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Interface (hardware and software) to automation |
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