Emitter sheet resistance is a primary quality control parameter for silicon wafers in PV applications after emitter diffusion. The CLS models, CLS-1, -3, and -5, Emitter Sheet Resistance Testers allow measurement of sheet resistance at 1 to 5 points with the high throughput that meets the requirements of in-line quality control in fully automated cell production lines.
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SYSTEM SPECIFICATIONS:
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measurement technique:
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sample size:
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100 to 210mm
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sample structure:
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np or pn junctions
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measurement range
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10 Ω/sq. to 200 Ω/sq.
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accuracy:
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<6%
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repeatability:
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<3%
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probe distance:
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3mm probe height above transport belt
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measured spot diameter:
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8mm
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wafer vertical position tolerance:
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<200 µm peak to peak, including vibration
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measure spot diameter:
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8mm
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| measurement speed: |
0.8s |
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sample support:
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on belt
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system dimensions:
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400mm x 398mm x 360mm
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| Additional configurations available if needed |
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| IN-LINE APPLICATION: |
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Emitter diffusion monitoring
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| CONFIGURATION OF A SYSTEM: |
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CLS module with appropriate number of measurement heads
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Industrial PC (Windows® operating system) and peripherals
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Interface (hardware and software) to automation |
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